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Ni-Al-O diffusion barrier layer for high-kappa metal-oxide-semiconductor capacitor 期刊论文
THIN SOLID FILMS, 2011, 卷号: 519, 期号: 10, 页码: 3358-3362
Authors:  Wu D. Q.;  Jia R.;  Yao J. C.;  Zhao H. S.;  Chang A. M.
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High-kappa Gate Dielectrics  Leakage Current Density  Er(2)o(3)  Ni-al-o  Diffusion Barrier Layer