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高介电栅介质ZrO2薄膜的物理电学性能 期刊论文
河北大学学报(自然科学版), 2009, 卷号: 29, 期号: 5, 页码: 484-488,554
Authors:  武德起;  姚金城;  赵红生;  常爱民;  李锋;  周阳
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Zro2薄膜  高介电栅介质  等效厚度  漏电流  
高介电栅介质材料HfO2掺杂后的物理电学特性(英文) 期刊论文
功能材料与器件学报, 2009, 卷号: 15, 期号: 1, 页码: 71-74
Authors:  武德起;  姚金城;  赵红生;  张东炎;  常爱民;  李锋;  周阳
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高介电栅介质材料  激光分子束外延  二氧化铪  
Leakage current mechanisms of ultrathin high-k Er2O3 gate dielectric film 期刊论文
Journal of Semiconductors, 2009, 卷号: 30, 期号: 10, 页码: 21-26
Authors:  Wu, Deqi;  Yao, Jincheng;  Zhao, Hongsheng;  Chang, Aimin;  Li, Feng
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Er_2o_3  High-kappa Gate Dielectrics  Leakage Current  Leakage Current Mechanisms  
QtUCP-A program for determining unit-cell parameters in electron diffraction experiments using double-tilt and rotation-tilt holders 期刊论文
Ultramicroscopy, 2008, 卷号: 108, 期号: 12, 页码: 1540-1545
Authors:  Zhao Hongsheng;  Wu Deqi;  Yao Jincheng;  Chang Aimin
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Electron Diffraction  Unit-cell Determination  Niggli-reduced Cell  Computer Program  
高介电栅介质材料研究进展 期刊论文
无机材料学报, 2008, 卷号: 23, 期号: 5, 页码: 865-871
Authors:  武德起;  赵红生;  姚金城;  张东炎;  常爱民
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高介电栅介质  晶化温度  低介电界面层  金属栅电极