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Investigating the TDDB lifetime growth mechanism caused by proton irradiation in partially depleted SOI devices 期刊论文
MICROELECTRONICS RELIABILITY, 2018, 卷号: 81, 期号: 2, 页码: 112-116
Authors:  Ma, T (Ma, Teng);  Yu, XF (Yu, Xuefeng);  Cui, JW (Cui, Jiangwei);  Zheng, QW (Zheng, Qiwen);  Zhou, H (Zhou, Hang);  Su, DD (Su, Dandan);  Guo, Q (Guo, Qi)
Adobe PDF(589Kb)  |  Favorite  |  View/Download:47/1  |  Submit date:2018/03/14
Reliability  Proton Irradiation  Radiation Induced Leakage Current (Rilc)  Time-dependent Dielectric Breakdown (Tddb)  Total Ionizing Does (Tid)  
沟道宽度对65nm金属氧化物半导体器件负偏压温度不稳定性的影响研究 期刊论文
电子学报, 2018, 卷号: 46, 期号: 5, 页码: 1128-1132
Authors:  崔江维;  郑齐文;  余德昭;  周航;  苏丹丹;  马腾;  魏莹;  余学峰;  郭旗
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65nm  负偏压温度不稳定性  沟道宽度  
总剂量辐射对65 nm NMOSFET热载流子敏感参数的影响 期刊论文
微电子学, 2018, 卷号: 48, 期号: 1, 页码: 126-130
Authors:  苏丹丹;  周航;  郑齐文;  崔江维;  孙静;  马腾;  魏莹;  余学峰;  郭旗
Adobe PDF(1083Kb)  |  Favorite  |  View/Download:41/0  |  Submit date:2018/03/19
65 Nm Nmosfet  总剂量效应  热载流子效应  
γ射线辐照对130 nm部分耗尽SOI MOS器件栅氧经时击穿可靠性的影响 期刊论文
红外与激光工程, 2018, 卷号: 47, 期号: 9, 页码: 214-219
Authors:  马腾;  苏丹丹;  周航;  郑齐文;  崔江维;  魏莹;  余学峰;  郭旗
Favorite  |  View/Download:24/0  |  Submit date:2018/10/18
场效应晶体管  可靠性  栅氧经时击穿  Γ射线  
一种用于光电材料光致发光谱辐射损伤的测试方法 专利
专利类型: 发明专利, 公开号: CN106370629A, 公开日期: 2017-02-01,
Inventors:  郭旗;  玛丽娅·黑尼;  艾尔肯·阿不都瓦衣提;  李豫东;  文林;  周东;  张兴尧;  陆妩;  余学峰;  何承发
Favorite  |  View/Download:0/0  |  Submit date:2019/08/07
An Increase in TDDB Lifetime of Partially Depleted SOI Devices Induced by Proton Irradiation 期刊论文
CHINESE PHYSICS LETTERS, 2017, 卷号: 34, 期号: 7, 页码: 181-184
Authors:  Ma, T (Ma, Teng);  Zheng, QW (Zheng, Qi-Wen);  Cui, JW (Cui, Jiang-Wei);  Zhou, H (Zhou, Hang);  Su, DD (Su, Dan-Dan);  Yu, XF (Yu, Xue-Feng);  Guo, Q (Guo, Qi)
Adobe PDF(686Kb)  |  Favorite  |  View/Download:31/0  |  Submit date:2017/12/14
纳米PMOSFET负偏压温度不稳定性测试方法 期刊论文
固体电子学研究与进展, 2017, 卷号: 37, 期号: 6, 页码: 433-437
Authors:  崔江维;  郑齐文;  余徳昭;  周航;  苏丹丹;  马腾;  郭旗;  余学峰
Adobe PDF(1113Kb)  |  Favorite  |  View/Download:26/0  |  Submit date:2018/01/18
纳米器件  P沟道金属氧化物半导体场效应晶体管  负偏压温度不稳定性  
Direct measurement and analysis of total ionizing dose effect on 130 nm PD SOI SRAM cell static noise margin 期刊论文
CHINESE PHYSICS B, 2017, 卷号: 26, 期号: 9, 页码: 1-5
Authors:  Zheng, QW (Zheng, Qiwen);  Cui, JW (Cui, Jiangwei);  Liu, MX (Liu, Mengxin);  Su, DD (Su, Dandan);  Zhou, H (Zhou, Hang);  Ma, T (Ma, Teng);  Yu, XF (Yu, Xuefeng);  Lu, W (Lu, Wu);  Guo, Q (Guo, Qi);  Zhao, FZ (Zhao, Fazhan)
Adobe PDF(496Kb)  |  Favorite  |  View/Download:45/0  |  Submit date:2017/12/05
Silicon-on-insulator  Total Ionizing Dose  Static Random Access Memory  Static Noise Margin  
总剂量效应致0.13μm部分耗尽绝缘体上硅N型金属氧化物半导体场效应晶体管热载流子增强效应 期刊论文
物理学报, 2016, 卷号: 65, 期号: 9, 页码: 242-249
Authors:  周航;  郑齐文;  崔江维;  余学峰;  郭旗;  任迪远;  余德昭;  苏丹丹
Adobe PDF(808Kb)  |  Favorite  |  View/Download:130/0  |  Submit date:2016/06/02
绝缘体上硅  电离辐射  热载流子  
Total dose responses and reliability issues of 65 nm NMOSFETs 期刊论文
Journal of Semiconductors, 2016, 卷号: 37, 期号: 6, 页码: 133-139
Authors:  Yu DZ(余德昭);  Zheng QW(郑齐文);  Cui JW(崔江维);  Zhou H(周航);  Yu XF(余学峰);  Guo Q(郭旗)
Adobe PDF(743Kb)  |  Favorite  |  View/Download:66/0  |  Submit date:2017/10/12