XJIPC OpenIR

Browse/Search Results:  1-3 of 3 Help

Selected(0)Clear Items/Page:    Sort:
Ni-Al-O diffusion barrier layer for high-kappa metal-oxide-semiconductor capacitor 期刊论文
THIN SOLID FILMS, 2011, 卷号: 519, 期号: 10, 页码: 3358-3362
Authors:  Wu D. Q.;  Jia R.;  Yao J. C.;  Zhao H. S.;  Chang A. M.
Adobe PDF(741Kb)  |  Favorite  |  View/Download:108/0  |  Submit date:2013/11/07
High-kappa Gate Dielectrics  Leakage Current Density  Er(2)o(3)  Ni-al-o  Diffusion Barrier Layer  
Leakage current mechanisms of ultrathin high-k Er2O3 gate dielectric film 期刊论文
Journal of Semiconductors, 2009, 卷号: 30, 期号: 10, 页码: 21-26
Authors:  Wu, Deqi;  Yao, Jincheng;  Zhao, Hongsheng;  Chang, Aimin;  Li, Feng
Adobe PDF(1210Kb)  |  Favorite  |  View/Download:141/0  |  Submit date:2014/11/11
Er_2o_3  High-kappa Gate Dielectrics  Leakage Current  Leakage Current Mechanisms  
高介电栅介质材料研究进展 期刊论文
无机材料学报, 2008, 卷号: 23, 期号: 5, 页码: 865-871
Authors:  武德起;  赵红生;  姚金城;  张东炎;  常爱民
Adobe PDF(777Kb)  |  Favorite  |  View/Download:171/6  |  Submit date:2012/11/29
高介电栅介质  晶化温度  低介电界面层  金属栅电极