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Ni-Al-O diffusion barrier layer for high-kappa metal-oxide-semiconductor capacitor 期刊论文
THIN SOLID FILMS, 2011, 卷号: 519, 期号: 10, 页码: 3358-3362
Authors:  Wu D. Q.;  Jia R.;  Yao J. C.;  Zhao H. S.;  Chang A. M.
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High-kappa Gate Dielectrics  Leakage Current Density  Er(2)o(3)  Ni-al-o  Diffusion Barrier Layer  
Leakage current mechanisms of ultrathin high-k Er2O3 gate dielectric film 期刊论文
Journal of Semiconductors, 2009, 卷号: 30, 期号: 10, 页码: 21-26
Authors:  Wu, Deqi;  Yao, Jincheng;  Zhao, Hongsheng;  Chang, Aimin;  Li, Feng
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Er_2o_3  High-kappa Gate Dielectrics  Leakage Current  Leakage Current Mechanisms  
高介电栅介质材料研究进展 期刊论文
无机材料学报, 2008, 卷号: 23, 期号: 5, 页码: 865-871
Authors:  武德起;  赵红生;  姚金城;  张东炎;  常爱民
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高介电栅介质  晶化温度  低介电界面层  金属栅电极