A study on the electrical properties of Mn-Co-Ni-O thin films grown by radio frequency magnetron sputtering with different thicknesses
Kong, WW (Kong, Wenwen)[ 1 ]; Wei, W (Wei, Wei)[ 1,2 ]; Gao, B (Gao, Bo)[ 1 ]; Chang, AM (Chang, Aimin)[ 1 ]
2017
发表期刊APPLIED SURFACE SCIENCE
ISSN0169-4332
卷号423期号:11页码:1012-1018
摘要

This study provides an insight to understanding the role of thickness on the hopping frequency (v(0)) of electrons between Mn3+ and Mn4+, the temperature coefficient of resistance (alpha(T)) and the characteristic temperature (T-0) in Mn-Co-Ni-O spinel films. A remarkable decrease in the Mn3+/Mn4+ ratio of films from 265 to 693 nm and an increase in the range of 693-887 nm can be probed by x-ray photoelectron spectroscopy. From the analysis of the Hall measurements, it is found that both the 1/v(0) and alpha(T) = 303K increase with the thickness below 693 nm, and then decrease above 693 nm. Such a feature is attributed to the change in the distribution of Mn cation. The T-0 are 3675, 3352, 3087, 3366 and 3816 K for films with thicknesses from 265 to 887 nm. It reveals that the ratio of Mn3+/Mn4+ should also be responsible for T-0, which can result in significantly different electrical properties of Mn-Co-Ni-O films with increasing thickness. The present result will open a way to design a desired negative temperature coefficient thermistor by adjusting the thickness of films.

关键词Ntc Films Thickness Magnetron Sputtering Hall Coefficient Electrical Properties
DOI10.1016/j.apsusc.2017.06.290
收录类别SCI
WOS记录号WOS:000410607500115
引用统计
文献类型期刊论文
条目标识符http://ir.xjipc.cas.cn/handle/365002/5021
专题中国科学院特殊环境功能材料与器件重点试验室
材料物理与化学研究室
通讯作者Gao, B (Gao, Bo)[ 1 ]; Chang, AM (Chang, Aimin)[ 1 ]
作者单位Chinese Acad Sci, Key Lab Funct Mat & Devices Special Environm, Xinjiang Tech Inst Phys & Chem,CAS, Xinjiang Key Lab Elect Informat Mat & Devices,Xin, 40-1 South Beijing Rd, Urumqi 830011, Peoples R China;Xinjiang Univ, Urumqi 830046, Peoples R China
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Kong, WW ,Wei, W ,Gao, B ,et al. A study on the electrical properties of Mn-Co-Ni-O thin films grown by radio frequency magnetron sputtering with different thicknesses[J]. APPLIED SURFACE SCIENCE,2017,423(11):1012-1018.
APA Kong, WW ,Wei, W ,Gao, B ,&Chang, AM .(2017).A study on the electrical properties of Mn-Co-Ni-O thin films grown by radio frequency magnetron sputtering with different thicknesses.APPLIED SURFACE SCIENCE,423(11),1012-1018.
MLA Kong, WW ,et al."A study on the electrical properties of Mn-Co-Ni-O thin films grown by radio frequency magnetron sputtering with different thicknesses".APPLIED SURFACE SCIENCE 423.11(2017):1012-1018.
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