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题名: Pattern imprinting in deep sub-micron static random access memories induced by total dose irradiation
作者: Zheng, Qi-Wen; Yu, Xue-Feng; Cui, Jiang-Wei; Guo, Qi; Ren, Di-Yuan; Cong, Zhong-Chao; Zhou, Hang
通讯作者: Yu, Xue-Feng
关键词: total dose irradiation ; static random access memory ; pattern imprinting ; deep sub-micron
刊名: Chinese Physics B
发表日期: 2014
DOI: 10.1088/1674-1056/23/10/106102
卷: 23, 期:10
收录类别: SCI
摘要: Pattern imprinting in deep sub-micron static random access memories (SRAMs) during total dose irradiation is investigated in detail. As the dose accumulates, the data pattern of memory cells loading during irradiation is gradually imprinted on their background data pattern. We build a relationship between the memory cell's static noise margin (SNM) and the background data, and study the influence of irradiation on the probability density function of ΔSNM, which is the difference between two data sides' SNMs, to discuss the reason for pattern imprinting. Finally, we demonstrate that, for micron and deep sub-micron devices, the mechanism of pattern imprinting is the bias-dependent threshold shift of the transistor, but for a deep sub-micron device the shift results from charge trapping in the shallow trench isolation (STI) oxide rather than from the gate oxide of the micron-device.
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内容类型: 期刊论文
URI标识: http://ir.xjipc.cas.cn/handle/365002/3927
Appears in Collections:中国科学院特殊环境功能材料与器件重点试验室_期刊论文

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作者单位: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Key Lab Funct Mat & Devices Special Environm, Urumqi 830011, Peoples R China; Xinjiang Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China;Univ Chinese Acad Sci, Beijing 100049, Peoples R China

Recommended Citation:
Zheng, Qi-Wen,Yu, Xue-Feng,Cui, Jiang-Wei,et al. Pattern imprinting in deep sub-micron static random access memories induced by total dose irradiation[J]. Chinese Physics B,2014,23(10).
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文件名: Pattern imprinting in deep sub-micron static random access memories induced by total dose irradiation.pdf
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