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Total dose effects on the matching properties of deep submicron MOS transistors
Wang, Yuxin; Hu, Rongbin; Li, Ruzhang; Chen, Guangbing; Fu, Dongbing; Lu, Wu
2014
Source PublicationJournal of Semiconductors
ISSN16744926
Volume35Issue:6
AbstractBased on 0.18 μm MOS transistors, for the first time, the total dose effects on the matching properties of deep submicron MOS transistors are studied. The experimental results show that the total dose radiation magnifies the mismatch among identically designed MOS transistors. In our experiments, as the radiation total dose rises to 200 krad, the threshold voltage and drain current mismatch percentages of NMOS transistors increase from 0.55% and 1.4% before radiation to 17.4% and 13.5% after radiation, respectively. PMOS transistors seem to be resistant to radiation damage. For all the range of radiation total dose, the threshold voltage and drain current mismatch percentages of PMOS transistors keep under 0.5% and 2.72%, respectively.
DOI10.1088/1674-4926/35/6/064007
Indexed ByEI
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Document Type期刊论文
Identifierhttp://ir.xjipc.cas.cn/handle/365002/3922
Collection材料物理与化学研究室
AffiliationScience and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;No. 24 Research Institute, China Electronics Technology Group Corporation, Chongqing 400060, China;Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Urumqi 830011, China
Recommended Citation
GB/T 7714
Wang, Yuxin,Hu, Rongbin,Li, Ruzhang,et al. Total dose effects on the matching properties of deep submicron MOS transistors[J]. Journal of Semiconductors,2014,35(6).
APA Wang, Yuxin,Hu, Rongbin,Li, Ruzhang,Chen, Guangbing,Fu, Dongbing,&Lu, Wu.(2014).Total dose effects on the matching properties of deep submicron MOS transistors.Journal of Semiconductors,35(6).
MLA Wang, Yuxin,et al."Total dose effects on the matching properties of deep submicron MOS transistors".Journal of Semiconductors 35.6(2014).
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