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题名: Influence of channel length and layout on TID for 0.18 mu m NMOS transistors
作者: Wu Xue; Lu Wu; Wang Xin; Guo Qi; He Chengfa; Li Yudong; Xi Shanbin; Sun Jing; Wen Lin
通讯作者: Lu, W
关键词: SCEs ; DIBL ; CLM ; Enclosed-layout
刊名: NUCLEAR SCIENCE AND TECHNIQUES
发表日期: 2013
卷: 24, 期:6
收录类别: SCI
摘要: Different channel lengths and layouts on 0.18 mu n NMOS transistors are designed for investigating the dependence of short channel effects (SCEs) on the width of shallow trench isolation (STI) devices and designing in radiation hardness. Results show that, prior to irradiation, the devices exhibited near-ideal I-V characteristics, with no significant SCEs. Following irradiation, no noticeable shift of threshold voltage is observed, radiation-induced edge-leakage current, however, exhibits significant sensitivity on TID. Moreover, radiation-enhanced drain induced barrier lowering (DIBL) and channel length modulation (CLM) effects are observed on short-channel NMOS transistors. Comparing to stripe-gate layout, enclosed gate layout has excellent radiation tolerance.
内容类型: 期刊论文
URI标识: http://ir.xjipc.cas.cn/handle/365002/3848
Appears in Collections:中国科学院特殊环境功能材料与器件重点试验室_期刊论文

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作者单位: Chinese Acad Sci, Key Lab Funct Mat & Devices Special Environm, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China;Xinjiang Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China;Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China

Recommended Citation:
Wu Xue,Lu Wu,Wang Xin,et al. Influence of channel length and layout on TID for 0.18 mu m NMOS transistors[J]. NUCLEAR SCIENCE AND TECHNIQUES,2013,24(6).
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文件名: Influence of channel length and layout on TID for 0.18 mu m NMOS transistors.pdf
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